The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2024

Filed:

Aug. 22, 2019
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventors:

Hajime Nishide, Kyoto, JP;

Kwichang Kang, Kyoto, JP;

Takao Matsumoto, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B01D 46/00 (2022.01); B08B 15/02 (2006.01); H01L 21/304 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B01D 46/0041 (2013.01); B08B 15/02 (2013.01); H01L 21/67178 (2013.01); H01L 21/6719 (2013.01); H01L 21/304 (2013.01); H01L 21/67017 (2013.01);
Abstract

In a substrate processing apparatus (), above a plurality of processing parts () arrayed in an up-and-down direction, arranged are a plurality of collecting pipes (a toc). The plurality of collecting pipes (a toc) correspond to a plurality of fluid classifications, respectively. Further, provided are a plurality of exhaust pipes () extending upward from the plurality of processing parts (), into which exhaust gases from the processing parts () flow, respectively. At an upper end portion of each of the exhaust pipes (), provided is a flow path switching part () which connects the upper end portion to the plurality of collecting pipes (a toc) and switches a flow path of the exhaust gas flowing in the exhaust pipe () among the plurality of collecting pipes (a toc). In the substrate processing apparatus (), it is possible to reduce a pressure loss in the exhaust pipe () and reduce a footprint.


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