Tokyo, Japan

Hajime Inami

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.7

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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2 patents (USPTO):Explore Patents

Title: Hajime Inami: Innovator in Radiation-Sensitive Resin Technology

Introduction

Hajime Inami is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of radiation-sensitive resin compositions, holding a total of 2 patents. His work is particularly relevant in the development of materials used in advanced manufacturing processes.

Latest Patents

Inami's latest patents include a radiation-sensitive resin composition and a method for forming a resist pattern. The radiation-sensitive resin composition comprises a resin with specific structural units, a radiation-sensitive acid generator, and a solvent. The composition is designed to enhance the performance of resist materials in various applications. Additionally, he has developed a production method for a composition used in resist top coat layers, which involves polymerizing a fluorine-containing monomer to create a specialized resin.

Career Highlights

Hajime Inami is associated with JSR Corporation, a leading company in the field of advanced materials. His innovative work has positioned him as a key figure in the development of new technologies that leverage radiation-sensitive materials. His contributions are vital for industries that rely on precision manufacturing and advanced coating technologies.

Collaborations

Inami has collaborated with notable colleagues, including Ryuichi Nemoto and Kota Furuichi. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Hajime Inami's work in radiation-sensitive resin technology exemplifies the importance of innovation in modern manufacturing. His patents and collaborations continue to influence the industry, paving the way for future advancements.

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