The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 24, 2022
Filed:
Dec. 11, 2019
Applicant:
Jsr Corporation, Tokyo, JP;
Inventors:
Sosuke Osawa, Tokyo, JP;
Kosuke Terayama, Tokyo, JP;
Hajime Inami, Tokyo, JP;
Kanako Ueda, Tokyo, JP;
Atsuto Nishii, Tokyo, JP;
Assignee:
JSR CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/11 (2006.01); G03F 7/028 (2006.01); G03F 7/032 (2006.01); C08F 220/18 (2006.01); G03F 7/20 (2006.01); G03F 7/16 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0046 (2013.01); C08F 220/18 (2013.01); G03F 7/0048 (2013.01); G03F 7/028 (2013.01); G03F 7/032 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/16 (2013.01); G03F 7/2041 (2013.01);
Abstract
Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.