Company Filing History:
Years Active: 2022
Title: Kanako Ueda: Innovator in Resist Coating Technologies
Introduction
Kanako Ueda is a prominent inventor based in Tokyo, Japan. She has made significant contributions to the field of resist coating technologies, particularly in the production of compositions for resist top coat layers. Her innovative work has led to the development of methods that enhance the performance and efficiency of resist patterns.
Latest Patents
Ueda holds a patent for a production method of a composition for resist top coat layers. This patent includes a method for forming resist patterns, a production method of fluorine-containing resin, and a method for improving the water repellency of resist top coat layers. The disclosed method involves polymerizing a monomer solution containing a fluorine-containing monomer in the presence of a polymerization initiator. This initiator generates an active species with a total of seven or more carbon atoms, resulting in the creation of a fluorine-containing resin A, which is then mixed with a solvent.
Career Highlights
Kanako Ueda is associated with JSR Corporation, a leading company in the field of advanced materials. Her work at JSR Corporation has positioned her as a key player in the development of innovative resist technologies. Ueda's expertise and dedication to her field have earned her recognition among her peers.
Collaborations
Ueda collaborates with talented coworkers, including Sosuke Osawa and Kosuke Terayama. Their combined efforts contribute to the advancement of technologies in resist coatings and related fields.
Conclusion
Kanako Ueda's contributions to resist coating technologies exemplify her innovative spirit and dedication to her work. Her patent and collaborations highlight her role as a significant inventor in the industry.