Company Filing History:
Years Active: 2022
Title: Kosuke Terayama: Innovator in Resist Coating Technology
Introduction
Kosuke Terayama is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of resist coating technology, particularly in the production of compositions for resist top coat layers. His innovative methods have implications for various applications in the semiconductor industry.
Latest Patents
Kosuke Terayama holds 1 patent related to his work. His patent focuses on a production method for a composition for resist top coat layers, which includes polymerizing a monomer solution containing a fluorine-containing monomer. This process involves the use of a polymerization initiator that generates an active species with a total of seven or more carbon atoms. The resulting fluorine-containing resin A is then mixed with a solvent to enhance its properties. This invention aims to improve the water repellency of resist top coat layers, which is crucial for effective resist pattern formation.
Career Highlights
Terayama is associated with JSR Corporation, a leading company in the field of advanced materials. His work at JSR Corporation has allowed him to focus on developing innovative solutions that meet the evolving needs of the semiconductor industry. His expertise in resist technology has positioned him as a key player in this specialized field.
Collaborations
Throughout his career, Kosuke Terayama has collaborated with notable colleagues, including Sosuke Osawa and Hajime Inami. These collaborations have fostered a creative environment that encourages the exchange of ideas and advancements in resist technology.
Conclusion
Kosuke Terayama's contributions to resist coating technology exemplify the importance of innovation in the semiconductor industry. His patented methods and collaborative efforts continue to drive advancements in this critical field.