Jsr Corporation

Hajime Inami

Sosuke Osawa

Ryuichi Nemoto

Kosuke Terayama

Atsuto Nishii

Kanako Ueda

Kota Furuichi

A radiation-sensitive resin composition includes: a resin including a structural unit (A) represented by formula (1) and a structural unit (B) having an acid-dissociable group; a radiation-sensitive acid generator; and a solvent. Ris a halogen atom-substituted or unsubstituted monovalent hydrocarbon group having 1 to 20 carbon atoms; X is —O— or —S—; Lis a halogen atom-substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms, and Ris a monovalent organic group having at least one structure selected from the group consisting of a lactone structure, a cyclic carbonate structure, and a sultone structure.

Radiation-sensitive resin composition and method for forming resist pattern

Disclosed herein is a method for producing a composition for resist top coat layer, the method including: polymerizing a monomer solution containing a fluorine-containing monomer in a presence of a polymerization initiator that cleaves to generate an active species having 7 or more carbon atoms in total to obtain a fluorine-containing resin A; and mixing the fluorine-containing resin A and a solvent.

Production method of composition for resist top coat layer, method of forming resist pattern, production method of fluorine-containing resin, and method of improving water repellency of resist top coat layer

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Tokyo, Japan

Hajime Inami