Hai Tran Quoc

Title: Innovations by Inventor Hai Tran Quoc

Introduction

Hai Tran Quoc is a notable inventor based in Orsay, France. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of thin film transistors. With a total of 4 patents to his name, his work has had a considerable impact on the industry.

Latest Patents

One of his latest patents is focused on an adhesion layer for thin film transistors. This method involves manufacturing a poly- or microcrystalline silicon layer on an insulator. It comprises a silicon-containing insulator, where a thin adhesion-promoting layer of amorphous silicon is grown, followed by the deposition of a poly- or microcrystalline silicon layer. This sequence, deposited using a PECVD method, ensures good adhesion of the silicon layer, which is advantageous in semiconductor production. Another significant patent is a method for manufacturing flat substrates. This innovation addresses the issue of metallic inner surfaces of PECVD reactors affecting the thickness and quality uniformity of the deposited silicon layer. By pre-coating parts of the reactor's wall with a dielectric layer, the quality of the deposited layer on large-surface substrates is improved.

Career Highlights

Throughout his career, Hai Tran Quoc has worked with prominent companies in the semiconductor industry, including Oerlikon Balzers AG and Oerlikon Trading AG, Trubbach. His expertise in the field has allowed him to develop innovative solutions that enhance manufacturing processes.

Collaborations

He has collaborated with notable professionals such as Jerome Villette and Maryam Kharrazi-Olsson, contributing to advancements in semiconductor technology.

Conclusion

Hai Tran Quoc's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of thin film transistors and manufacturing processes.