The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2011

Filed:

Feb. 18, 2009
Applicants:

Hai Tran Quoc, Orsay, FR;

Jerome Villette, Le Plessis Robinson, FR;

Inventors:

Hai Tran Quoc, Orsay, FR;

Jerome Villette, Le Plessis Robinson, FR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

For avoiding the metallic inner surface of a PECVD reactor to influence thickness uniformity and quality uniformity of a μc-Si layer () deposited on a large-surface substrate, () before each substrate is single treated at least parts of the addressed wall are precoated with a dielectric layer ().


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