Company Filing History:
Years Active: 2014-2018
Title: Innovations of Gyuwan Choi in Semiconductor Technology
Introduction
Gyuwan Choi is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approaches. His work primarily focuses on methods that enhance the fabrication of semiconductor devices.
Latest Patents
One of Gyuwan Choi's latest patents is titled "Methods of forming a hard mask layer and of fabricating a semiconductor device using the same." This patent describes a method for forming a hard mask layer on a substrate by utilizing an amorphous carbon layer created with nitrous oxide (NO). The process involves introducing a source of carbon and nitrous oxide under a plasma ambient of an inert gas. The resulting amorphous carbon layer contains nitrogen and oxygen in specific concentrations, which are crucial for the subsequent etching process of the semiconductor device.
Another significant patent is "Semiconductor device with vertical channel transistor and method of fabricating the same." This invention outlines a method for fabricating a semiconductor device that includes vertical channel transistors. The process involves several steps, including patterning a substrate to create a trench, forming a sacrificial pattern, and doping the sidewall of the trench to establish a doped region in the active area.
Career Highlights
Gyuwan Choi is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in developing advanced methods that improve device performance and manufacturing efficiency.
Collaborations
Gyuwan collaborates with talented individuals in his field, including Seonghwee Cheong and Mansug Kang. Their combined expertise contributes to the innovative projects at Samsung Electronics.
Conclusion
Gyuwan Choi's contributions to semiconductor technology through his patents reflect his dedication to innovation and excellence. His work not only advances the field but also sets a foundation for future developments in semiconductor manufacturing.