This inventor holds 4 USPTO granted patents and 2 published patent applications. Top assignees: Globalfoundries Singapore Pte. Ltd., Globalfoundries Inc.. Active years: 2015-2017.
Company Filing History:
3 out of 1,055 
1 out of 5,671 
Years Active: 2015-2017
Title: Guo Xiang Ning: Innovator in Semiconductor Technology
Introduction
Guo Xiang Ning is a notable inventor based in Ballston Lake, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing etching processes and optimizing reticle designs for improved semiconductor manufacturing.
Latest Patents
Guo's latest patents include innovative methods for hard mask etching and dielectric etching. One of his patents describes a method and apparatus for generating final compensation tables for dielectric and hard mask etching processes. This involves performing overlap pattern classification on a wafer and calibrating etch biases based on the classification. Another patent addresses cross technology reticle (CTR) and multi-layer reticle (MLR) techniques, aimed at reducing reticle transmission differences and optimizing layer placement for overlay in semiconductor production.
Career Highlights
Throughout his career, Guo has worked with prominent companies in the semiconductor industry, including GlobalFoundries Singapore Pte. Ltd. and GlobalFoundries Inc. His expertise in etching processes and reticle optimization has made him a valuable asset in these organizations.
Collaborations
Guo has collaborated with notable professionals in the field, including Paul Willard Ackmann and Arthur Hotzel. These collaborations have contributed to advancements in semiconductor technology and innovation.
Conclusion
Guo Xiang Ning's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the efficiency and effectiveness of semiconductor manufacturing processes.