Location History:
- Aalen, DE (2007)
- Hamburg, DE (2010 - 2012)
Company Filing History:
Years Active: 2007-2012
Title: Gordon Doering: Innovator in Optical Systems
Introduction
Gordon Doering is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of optical systems, particularly in microlithography. With a total of 3 patents to his name, his work has advanced the technology used in imaging optical systems.
Latest Patents
Doering's latest patents include innovative technologies such as a projection objective for microlithography, a projection exposure apparatus, and a projection exposure method along with an optical correction plate. The projection objective is designed to image a pattern from an object field to an image field using electromagnetic radiation. It features a plurality of optical elements, including an optical correction plate that is transparent to the operating radiation. This plate has a unique thickness profile and non-rotationally symmetric aspheric surface profiles, which enhance the imaging quality. Additionally, he has developed methods and apparatuses for determining optical properties of imaging systems, which involve test structures and image recording devices to capture precise images.
Career Highlights
Throughout his career, Gordon Doering has worked with prominent companies such as Carl Zeiss SMT AG and Carl Zeiss SMT GmbH. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in optical technology.
Collaborations
Doering has collaborated with esteemed colleagues, including Ulrich Wegmann and Helmut Haidner. These partnerships have fostered a creative environment that has led to innovative solutions in the field of optics.
Conclusion
Gordon Doering's contributions to optical systems and microlithography have established him as a key figure in the industry. His patents reflect a commitment to advancing technology and improving imaging systems.