Company Filing History:
Years Active: 2010-2020
Title: The Innovations of Geum-jung Seong
Introduction
Geum-jung Seong is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced integrated circuit devices, particularly in the area of fin field-effect transistors.
Latest Patents
One of his latest patents is for a FinFET with various shaped source/drain regions. This semiconductor device features a substrate with a fin active region pattern that has a protruding shape. It includes a device isolation layer pattern that covers the side surface of the lower portion of the fin active region pattern, along with a spacer pattern that covers a side surface of the fin active region pattern. The source/drain region is in contact with the top surface of both the fin active region pattern and the spacer pattern.
Another notable patent is for an integrated circuit device that includes an asymmetrical fin field-effect transistor. This device comprises a first fin active region extending in a first direction parallel to the substrate's top surface, and a second fin active region that is spaced apart from the first in a different direction. The design features a gate line intersecting both fin active regions, with source/drain regions that have an asymmetric shape in their cross-section.
Career Highlights
Geum-jung Seong is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of integrated circuits, making them more efficient and effective.
Collaborations
He has collaborated with notable colleagues such as Byoung-ho Kwon and Cheol Kyu Kim, contributing to various projects that enhance the performance of semiconductor devices.
Conclusion
Geum-jung Seong's contributions to the field of semiconductor technology are significant and impactful. His innovative patents and collaborations reflect his dedication to advancing technology in this critical area.
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