Gerald L Leake

Title: Gerald L. Leake: A Pioneer in Optoelectronics

Introduction

Gerald L. Leake, an accomplished inventor based in Delmar, NY, has made significant contributions to the field of optoelectronics, holding nine patents to his name. His innovative work focuses on enhancing photonics technology, demonstrating his proficiency in creating advanced optoelectrical devices.

Latest Patents

Among his latest patents, the "Wafer Scale Bonded Active Photonics Interposer" stands out. This patent describes an optoelectrical device that includes a substrate and an interposer dielectric stack. The interposer stack integrates a base dielectric with a photonics device dielectric stack, bonded by a specialized layer. The methodology outlined in this patent provides a systematic approach to building an interposer base structure on a first wafer, complete with through vias and metallization layers, followed by creating a photonics structure on a second wafer with photonics devices. Another notable patent is centered around "Integrated Photonics Including Waveguiding Material," which incorporates waveguides formed by the patterning of waveguiding materials, such as silicon and silicon nitride, designed to propagate light energy effectively.

Career Highlights

Gerald L. Leake's career is anchored at the State University of New York, where he leverages his expertise to push the boundaries of photonics technology. His contributions have not only advanced academic research but also opened doors to practical applications in the industry.

Collaborations

Throughout his career, Leake has collaborated with esteemed colleagues, including Douglas Duane Coolbaugh and Thomas N. Adam. These collaborations have enriched his work and led to further innovations in the field of photonics.

Conclusion

In conclusion, Gerald L. Leake exemplifies the innovative spirit that drives advancements in technology. His patents reflect a deep understanding of optoelectronics, positioning him as a pivotal figure in the industry. As he continues to contribute to research and development, his work will likely inspire future generations of inventors and innovators.