Garrett Ho Yee Sin is a prominent inventor based in Sunnyvale, CA, known for his contributions to the field of chemical mechanical polishing processes. With a total of nine patents to his name, he has made significant advancements in the technology used for surface preparation.

Latest Patents

One of his latest patents is titled "Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes." This invention discloses a retaining ring that includes a body with an upper and lower portion, featuring a sacrificial surface on the lower portion. The sacrificial surface has a negative tapered design with a taper height ranging from about 0.0003 inches to about 0.00015 inches. Another notable patent is "Polishing system with local area rate control and oscillation mode." This patent describes a polishing module that includes a chuck with a substrate receiving surface and a perimeter. The module features polishing pad assemblies that are coupled to an actuator, allowing for movement in various directions while being limited in radial movement.

Career Highlights

Garrett works at Applied Materials, Inc., a leading company in the semiconductor and display industries. His work focuses on enhancing the efficiency and effectiveness of polishing processes, which are critical in the manufacturing of semiconductor devices.

Collaborations

Throughout his career, Garrett has collaborated with talented individuals such as Huanbo Zhang and King Yi Heung. These collaborations have contributed to the development of innovative solutions in the field.

Conclusion

Garrett Ho Yee Sin's contributions to the field of chemical mechanical polishing processes through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in semiconductor manufacturing technology.

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