The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2019
Filed:
Oct. 09, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
David Masayuki Ishikawa, Mountain View, CA (US);
Jeonghoon Oh, Saratoga, CA (US);
Garrett Ho Yee Sin, San Jose, CA (US);
Charles C. Garretson, Sunnyvale, CA (US);
Huanbo Zhang, San Jose, CA (US);
Chia-Ling Pai, Santa Clara, CA (US);
Niraj Prasad, Sunnyvale, CA (US);
Julio David Muzquiz, Austin, TX (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 37/32 (2012.01);
U.S. Cl.
CPC ...
B24B 37/32 (2013.01);
Abstract
A retaining ring for a polishing process is disclosed. The retaining ring includes a body comprising an upper portion and a lower portion, and a sacrificial surface disposed on the lower portion, the sacrificial surface comprising a negative tapered surface having a taper height that is about 0.0003 inches to about 0.00015 inches.