This inventor holds 2 USPTO granted patents. Top assignees: Tokyo Electron Limited, Other. Active years: 2002-2003.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:

Years Active: 2002-2003
Title: Gareth E Guest: Innovator in Plasma Technology
Introduction
Gareth E Guest is a notable inventor based in La Jolla, California. He has made significant contributions to the field of plasma technology, holding a total of 2 patents. His innovative work focuses on methods for efficiently pumping ions, which has implications for various applications in technology and industry.
Latest Patents
Gareth's latest patents include the "Plasma Vacuum Pump" and the "Plasma Vacuum Pumping Cell." The Plasma Vacuum Pump is designed to pump ions from one region to another using a partition member with a through opening that defines multiple conduits. It incorporates a group of magnets to provide magnetic forces extending to the conduits, along with several electric potential sources that create electrostatic fields to accelerate ions. The Plasma Vacuum Pumping Cell serves a similar purpose, interposing between two regions to facilitate ion movement. It features a partition member with a conduit, strategically positioned magnets, a source of free electrons, and an electric potential source to enhance ion acceleration.
Career Highlights
Throughout his career, Gareth has worked with various companies, including Tokyo Electron Limited. His experience in the industry has allowed him to develop and refine his innovative ideas, contributing to advancements in plasma technology.
Collaborations
Gareth has collaborated with notable individuals such as Wayne L Johnson and Raphael A Dandl. These partnerships have likely enriched his work and led to further innovations in his field.
Conclusion
Gareth E Guest is a distinguished inventor whose work in plasma technology has led to valuable patents and advancements. His contributions continue to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile