Fremont, CA, United States of America

Gang Grant Peng

USPTO Granted Patents = 12 

 

Average Co-Inventor Count = 3.8

ph-index = 1

Forward Citations = 13(Granted Patents)


Location History:

  • Hershey, PA (US) (2005 - 2007)
  • Fremont, CA (US) (2005 - 2023)
  • Santa Clara, CA (US) (2023)

Company Filing History:


Years Active: 2005-2023

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12 patents (USPTO):

Title: Gang Grant Peng: A Pioneer in Semiconductor Cleaning Technologies

Introduction

Gang Grant Peng is an accomplished inventor based in Fremont, CA, who has made significant contributions to the field of semiconductor cleaning technologies. With a total of 12 patents to his name, Peng is recognized for his innovative solutions that enhance the efficiency and effectiveness of cleaning processes in substrate processing equipment.

Latest Patents

Among Peng's latest inventions are two notable patents. The first is titled "Wet cleaning of electrostatic chuck," which describes a cleaning fixture and method designed to prevent chemical solutions from contacting various features of the substrate supporting member. This invention includes a mounting plate with various configurations that ensure a sealed plenum when coupled with an electrostatic chuck, ultimately protecting the integrity of the cleaning process.

The second patent, "Hyperbaric clean method and apparatus for cleaning semiconductor chamber components," showcases a comprehensive cleaning system that utilizes a boiler, clean chamber, and expansion chamber for effective component cleaning. This innovative method ensures thorough cleaning while incorporating advanced features like heaters and vacuum ports to optimize the cleaning environment.

Career Highlights

Gang Grant Peng has worked with several notable companies throughout his career, most prominently with Applied Materials, Inc. His expertise in semiconductor technologies has positioned him as a critical figure in developing systems that play a vital role in the efficiency of semiconductor fabrication processes.

Collaborations

Throughout his career, Peng has collaborated with esteemed colleagues, including David Walter Groechel and Tuochuan Huang. Their combined expertise and innovative spirit have propelled advancements in semiconductor cleaning technologies.

Conclusion

Gang Grant Peng stands as a prominent inventor within the semiconductor industry, exemplifying the spirit of innovation and dedication. His advancements in cleaning methodologies continue to have a lasting impact on the efficiency of semiconductor manufacturing processes, showcasing the vital role of inventors in pushing the boundaries of technology.

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