The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

May. 02, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Tuochuan Huang, Saratoga, CA (US);

Gang Peng, Fremont, CA (US);

David W. Groechel, Los Altos Hills, CA (US);

Vijay D. Parkhe, San Jose, CA (US);

Shinnosuke Kawaguchi, Tokyo, JP;

David Benjaminson, Campbell, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); B08B 3/12 (2006.01); H01L 21/683 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67028 (2013.01); B08B 3/12 (2013.01); H01L 21/6831 (2013.01);
Abstract

Embodiments described herein relate a cleaning fixture and method to prevent chemical solutions from contacting the various substrate supporting member features and penetrating into the holes and the metal plate of the substrate supporting surface. The cleaning fixture includes a mounting plate having a plurality of thru-holes arranged on a bolt circle and configured to align with a plurality of thread holes disposed in an electrostatic chuck, a recess formed in the mounting plate, and a gas port formed through the mounting plate. A sealed plenum is formed between the recess of the mounting plate and a lower surface of the electrostatic chuck when the electrostatic chuck is coupled to the mounting plate. The gas port is fluidly coupled to the sealed plenum.


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