Fumihiko Matsumura

Title: Fumihiko Matsumura: Innovator in Oxide Semiconductor Technology

Introduction

Fumihiko Matsumura is a prominent inventor based in Ome, Japan. He has made significant contributions to the field of oxide semiconductors, holding a total of 7 patents. His work focuses on developing materials that enhance the performance of semiconductor devices.

Latest Patents

Matsumura's latest patents include innovations related to oxide sintered bodies, sputtering targets, and oxide semiconductor thin films. One of his notable inventions provides an oxide sintered compact that achieves low carrier density and high carrier mobility when used to create an oxide semiconductor thin film through a sputtering method. This oxide sintered compact contains oxides of indium, gallium, and aluminum, with specific atomic ratios for gallium and aluminum. Another patent describes an oxide sintered body that, when utilized for sputtering, can produce a semiconductor thin film with a carrier concentration of less than 3.0×10^cm and a carrier mobility of at least 10 cm/Vsec.

Career Highlights

Fumihiko Matsumura is currently employed at Sumitomo Metal Mining Company, Ltd. His work at this company has allowed him to further his research and development in semiconductor technologies. His innovative approaches have positioned him as a key figure in the advancement of oxide semiconductor materials.

Collaborations

Matsumura has collaborated with notable colleagues, including Tokuyuki Nakayama and Eiichiro Nishimura. These partnerships have contributed to the successful development of his patented technologies.

Conclusion

Fumihiko Matsumura's contributions to the field of oxide semiconductors are noteworthy, and his patents reflect his commitment to innovation. His work continues to influence the development of advanced semiconductor materials and technologies.