Fumihiko Kimura

Title: Fumihiko Kimura: Innovator in Epitaxial Silicon Wafer Technology

Introduction

Fumihiko Kimura is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of epitaxial silicon wafers. With a total of 11 patents to his name, Kimura's work has had a lasting impact on the industry.

Latest Patents

One of Kimura's latest patents is a manufacturing method of an epitaxial silicon wafer. This method utilizes an epitaxial growth apparatus that includes a susceptor and a heat ring. The process involves determining the surface position of a silicon wafer to be higher than the peripheral portion of the susceptor and lower than the heat ring. This adjustment helps control the film thickness of the epitaxial layer formed on different orientations of the silicon wafer.

Another notable patent is for an epitaxial growth apparatus and method designed to suppress temperature variation in semiconductor wafers. This invention aims to manufacture high-quality epitaxial wafers by utilizing a susceptor support shaft that ensures stability and uniformity during the growth process.

Career Highlights

Throughout his career, Fumihiko Kimura has worked with several notable companies, including Kureha Kagaku Kogyo Kabushiki Kaisha and Sumco Corporation. His experience in these organizations has contributed to his expertise in semiconductor manufacturing and epitaxial growth technologies.

Collaborations

Kimura has collaborated with esteemed colleagues such as Yutaka Mukaida and Sakuo Noda. These partnerships have further enriched his work and innovations in the field.

Conclusion

Fumihiko Kimura's contributions to the semiconductor industry, particularly in epitaxial silicon wafer technology, have established him as a leading inventor. His innovative patents and collaborations continue to influence advancements in semiconductor manufacturing.