This inventor holds 3 USPTO granted patents. Top assignees: Tanaka Kikinzoku Kogyo K.k., Tama-Tlo Corporation. Active years: 2012-2016.
Company Filing History:
Years Active: 2012-2016
Title: Fujio Hiroki: Innovator in Physical Vapor Deposition Technology
Introduction
Fujio Hiroki is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of physical vapor deposition technology. With a total of 3 patents to his name, Hiroki has developed innovative methods and apparatuses that enhance the film formation process.
Latest Patents
Hiroki's latest patents focus on a physical vapor deposition apparatus and method. This technology is designed for forming a film of substances that are challenging to convert into fine particles, even when subjected to heating by plasma or arc discharge. The apparatus includes an evaporation chamber containing an evaporation source material and a heating part for heating this material. Additionally, it features a powder supply source and a film forming chamber. The evaporation source material is heated to produce fine particles, which are then sprayed out of a supersonic nozzle and deposited on a substrate for film formation through physical vapor deposition.
Career Highlights
Throughout his career, Fujio Hiroki has worked with prominent companies such as Tanaka Kikinzoku Kogyo K.K. and Tama-Tlo Corporation. His experience in these organizations has contributed to his expertise in the field of vapor deposition technology.
Collaborations
Hiroki has collaborated with notable coworkers, including Naotake Niwa and Atsushi Yumoto. Their joint efforts have further advanced the innovations in physical vapor deposition.
Conclusion
Fujio Hiroki's contributions to the field of physical vapor deposition technology are noteworthy. His innovative patents and career achievements reflect his dedication to advancing this important area of research and development.