The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
Jul. 28, 2008
Atsushi Yumoto, Tokyo, JP;
Naotake Niwa, Tokyo, JP;
Fujio Hiroki, Tokyo, JP;
Takahisa Yamamoto, Kashiwa, JP;
Atsushi Yumoto, Tokyo, JP;
Naotake Niwa, Tokyo, JP;
Fujio Hiroki, Tokyo, JP;
Takahisa Yamamoto, Kashiwa, JP;
Tanaka Kikinzoku Kogyo K.K., Tokyo, JP;
Abstract
A physical vapor deposition apparatus and a physical vapor deposition method for forming a film of a substance which is hard to be made fine particles even when it is heated by plasma, arc discharge, or the like are provided. It has an evaporation chamberprovided inside it with an evaporation source materialand a heating partfor heating the evaporation source material, a powder supply sourceprovided inside it with a powder, and a film forming chamber, wherein the evaporation source materialis heated by the heating partto produce fine particles (nanoparticles), the fine particles and powder are sprayed out of a supersonic nozzle, are placed on a supersonic gas stream, and are deposited on a substrate for film formationby physical vapor deposition.