Taichung, Taiwan

Fu-Sheng Lee

This inventor holds 4 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2001-2003.


% Patents Active = 100.0

Average Co-Inventor Count = 2.3

ph-index = 2

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2001-2003

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4 patents (USPTO):Explore Patents

Title: Fu-Sheng Lee: Innovator in Photomask Technology

Introduction

Fu-Sheng Lee is a prominent inventor based in Tai-Chung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in photomask technology. With a total of 4 patents to his name, Lee continues to push the boundaries of innovation in his industry.

Latest Patents

Among his latest patents, Lee has developed a photomask ESD protection system and an anti-ESD pod designed for transporting photomasks. This active anti-ESD pod features six body portions that form the container, an electrically conducting plate on the top, and a conducting handle connected to the plate. The design includes an active charge sinker that absorbs static electricity, preventing charge accumulation that could lead to ESD damage. Another notable patent is a method for endpoint detection in copper chemical mechanical polishing (CMP). This method involves adding a copper isotope to the deposited copper layer, allowing for the measurement of radioactivity during polishing. The endpoint is determined by observing changes in radioactivity, ensuring precision in the polishing process.

Career Highlights

Fu-Sheng Lee is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he applies his expertise in semiconductor technology. His work has been instrumental in enhancing the reliability and efficiency of photomask handling and processing.

Collaborations

Lee has collaborated with notable colleagues, including Chien-Chen Chen and Jiun-Chung Lee, contributing to various projects that advance semiconductor technology.

Conclusion

Fu-Sheng Lee's innovative work in photomask technology and semiconductor manufacturing showcases his commitment to excellence and advancement in the field. His patents reflect a deep understanding of the challenges in the industry and a dedication to finding effective solutions.

Profile summary based on public USPTO records.
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