The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2003
Filed:
Jul. 12, 2001
Applicant:
Inventor:
Fu-Sheng Lee, Tai-Chung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd, Hsin Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04L 2/7108 ;
U.S. Cl.
CPC ...
H04L 2/7108 ;
Abstract
An active anti-ESD pod for transporting photomask (reticle) comprises six body portions delimiting the container, an electrically conducting plate on the top portion, and an electrically conducting handle connected to the plate. An active charge sinker combined with a tag identifying the container or placed onto the photomask itself is provided to absorb the static electricity and to thus prevent charge accumulation that may otherwise cause ESD damage to the photomask.
Lee, Fu-Sheng. (2003). Photomask esd protection and an anti-esd pod with such protection (U.S. Patent No. 6528836). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6528836
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile