Fu-ming Huang

Title: Fu-ming Huang: Innovator in Semiconductor Polishing Technologies

Introduction

Fu-ming Huang is a notable inventor based in Changhua County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in polishing technologies. With a total of 2 patents to his name, Huang's work has advanced the methods used in the production of integrated circuits.

Latest Patents

Huang's latest patents include a slurry composition and method for polishing integrated circuits. The first patent describes a slurry composition that consists of a slurry and at least one rheology modifier. This composition includes at least one liquid carrier, abrasives, and oxidizers, with the rheology modifier being dispensed in the slurry. The polishing method utilizes this slurry composition to effectively polish a conductive layer.

His second patent outlines a method for chemical mechanical polishing (CMP). This method involves several operations, including receiving a metal stack that contains at least a first and a second metal layer. A protecting layer is formed over the second metal layer, which safeguards it during the etching of a portion of the first metal layer. The process ensures that the top surface of the etched first metal layer is lower than that of the protecting layer, which is subsequently removed from the second metal layer.

Career Highlights

Fu-ming Huang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at TSMC has allowed him to apply his innovative ideas in a practical setting, contributing to the advancement of semiconductor technologies.

Collaborations

Huang has collaborated with notable colleagues such as Ji Cui and Chi-Jen Liu. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the semiconductor field.

Conclusion

Fu-ming Huang's contributions to semiconductor polishing technologies through his patents and work at TSMC highlight his role as an influential inventor in the industry. His innovative approaches continue to shape the future of integrated circuit manufacturing.