Company Filing History:
Years Active: 2007-2008
Title: Frederick Eduard De Jong: Innovator in Lithographic Technology
Introduction
Frederick Eduard De Jong, a renowned inventor based in Eindhoven, NL, has made significant contributions to the field of lithographic technology. With a remarkable portfolio of two patents, De Jong's innovative work has propelled advancements in calibration substrates and lithographic apparatus design.
Latest Patents
De Jong's latest patents showcase his expertise in lithographic technology. The first patent is for a Calibration Substrate and method for calibrating a lithographic apparatus. This substrate features precise flat surfaces and an innovative thermal expansion coefficient to minimize deformation during calibration processes. The second patent revolves around a Lithographic apparatus and device manufacturing method, highlighting his contributions to the design of cutting-edge lithographic systems.
Career Highlights
Currently affiliated with ASML Netherlands B.V., a leading player in the semiconductor industry, De Jong has demonstrated a strong commitment to innovation and excellence. His work at ASML has significantly impacted the development of lithographic technologies, ensuring high precision and efficiency in semiconductor manufacturing processes.
Collaborations
De Jong has collaborated with notable professionals in the industry, including Joost Jeroen Ottens and Jeroen Johannes Sophia Maria Mertens. These collaborative efforts have led to innovative solutions in lithographic technology, further solidifying De Jong's reputation as a key figure in the field.
Conclusion
Inventor Frederick Eduard De Jong's relentless pursuit of innovation in lithographic technology has positioned him as a prominent figure in the industry. His patents, career achievements, and collaborations underscore his dedication to advancing semiconductor manufacturing processes. De Jong's contributions continue to shape the future of lithography, inspiring further advancements in the field.