The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 04, 2007
Filed:
Aug. 13, 2004
Theodorus Petrus Maria Cadee, Vlierden, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frederick Eduard DE Jong, Eindhoven, NL;
Koen Goorman, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Bart Leonard Peter Schoondermark, Amhem, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Stoyan Nihtianov, Eindhoven, NL;
Theodorus Petrus Maria Cadee, Vlierden, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frederick Eduard De Jong, Eindhoven, NL;
Koen Goorman, Eindhoven, NL;
Boris Menchtchikov, Eindhoven, NL;
Marco Koert Stavenga, Eindhoven, NL;
Martin Frans Pierre Smeets, Veldhoven, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Bart Leonard Peter Schoondermark, Amhem, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Stoyan Nihtianov, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.