Asml Netherlands B.v.

Frederick Eduard De Jong

Jeroen Johannes Sophia Maria Mertens

Joost Jeroen Ottens

Boris Menchtchikov

Koen Goorman

Patricius Aloysius Jacobus Tinnemans

Marco Koert Stavenga

Theodorus Petrus Maria Cadee

Stoyan Nihtianov

Aschwin Lodewijk Hendricus Johannes Van Meer

Martin Frans Pierre Smeets

Bart Leonard Peter Schoondermark

A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0&#xd7;10Kto reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.

Calibration substrate and method for calibrating a lithographic apparatus

A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a liquid supply system configured to at least partly fill a space between the projection system and the substrate with liquid, a seal member arranged to substantially contain the liquid within the space, and elements to control and/or compensate for evaporation of immersion liquid from the substrate.

Lithographic apparatus and device manufacturing method

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Eindhoven, Netherlands

Frederick Eduard De Jong