The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 18, 2008

Filed:

Dec. 08, 2004
Applicants:

Joost Jeroen Ottens, Veldhoven, NL;

Jeroen Johannes Sophia Maria Mertens, Duizel, NL;

Frederick Eduard DE Jong, Eindhoven, NL;

Koen Goorman, Eindhoven, NL;

Boris Menchtchikov, Eindhoven, NL;

Inventors:

Joost Jeroen Ottens, Veldhoven, NL;

Jeroen Johannes Sophia Maria Mertens, Duizel, NL;

Frederick Eduard De Jong, Eindhoven, NL;

Koen Goorman, Eindhoven, NL;

Boris Menchtchikov, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/256 (2006.01); H01L 21/00 (2006.01); G03B 27/58 (2006.01);
U.S. Cl.
CPC ...
Abstract

A calibration substrate for use during calibration of a lithographic apparatus is disclosed. The calibration substrate includes a first substantially flat surface, a second substantially flat surface that is substantially parallel to the first surface, and an edge that connects the first surface to the second surface. The calibration substrate has a thermal expansion coefficient of less than about 1.0×10Kto reduce deformation thereof due to thermal changes in the substrate while in the lithographic apparatus.


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