Richardson, TX, United States of America

Farris D Malone

This inventor holds 5 USPTO granted patents. Top assignee: Texas Instruments Corporation. Active years: 2001-2008.


% Patents Active = 100.0

Average Co-Inventor Count = 2.1

ph-index = 1

Forward Citations = 13(Granted Patents)


Company Filing History:


Years Active: 2001-2008

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5 patents (USPTO):Explore Patents

Title: Farris D Malone: Innovator in Metal-Insulator-Metal Capacitor Technology

Introduction

Farris D Malone is a notable inventor based in Richardson, TX (US). He has made significant contributions to the field of semiconductor technology, particularly in the manufacturing of metal-insulator-metal capacitors. With a total of 5 patents to his name, Malone's work has had a considerable impact on the industry.

Latest Patents

One of Malone's latest patents is a method of manufacturing a metal-insulator-metal capacitor. This invention provides a detailed process that includes depositing a first refractory metal layer over a semiconductor substrate. The first refractory metal layer over a capacitor region of the semiconductor substrate is then removed, followed by the deposition of a second refractory metal over the capacitor region. Other aspects of this invention include the development of a metal-insulator-metal capacitor and a method for manufacturing an integrated circuit.

Career Highlights

Farris D Malone is currently employed at Texas Instruments Corporation, where he continues to innovate and develop new technologies. His work at Texas Instruments has allowed him to collaborate with other talented professionals in the field, further enhancing his contributions to semiconductor technology.

Collaborations

Some of Malone's coworkers include Ingrid G Jenkins and Sima Salamati-Saradh. Their collaborative efforts have likely contributed to the advancements in the projects they have worked on together.

Conclusion

Farris D Malone is a distinguished inventor whose work in metal-insulator-metal capacitor technology has paved the way for advancements in semiconductor manufacturing. His contributions continue to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
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