Fangyue Liu

Title: Innovations of Fangyue Liu in Semiconductor Technology

Introduction

Fangyue Liu is a prominent inventor based in Singapore, known for his significant contributions to semiconductor technology. With a total of three patents to his name, Liu has made strides in developing advanced semiconductor structures that enhance device performance.

Latest Patents

Liu's latest patents include innovative designs that focus on improving semiconductor structures. One of his notable patents is titled "Under-source body contact," which relates to semiconductor structures and methods of manufacture. This patent describes a structure that includes a gate structure on a semiconductor layer, a drift region within the semiconductor layer, a body region below the gate structure, and a contact region devoid of a silicide contact. Additionally, he has developed a patent for "Contact via structures of semiconductor devices," which details a semiconductor device that includes a substrate, a conductive feature over the substrate, and a contact via structure that electrically couples to the conductive feature with a concave profile.

Career Highlights

Fangyue Liu is currently employed at Globalfoundries Singapore Pte. Ltd., where he continues to innovate in the field of semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and reliable.

Collaborations

Liu collaborates with talented professionals in his field, including coworkers Rui Tze Toh and Liang Li. These collaborations foster an environment of innovation and creativity, leading to groundbreaking advancements in semiconductor technology.

Conclusion

Fangyue Liu's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the development of advanced semiconductor devices, showcasing the importance of innovation in technology.