Location History:
- Taoyuan, TW (2005)
- Hsinchu, TW (2003 - 2006)
Company Filing History:
Years Active: 2003-2006
Title: Innovations by Fang-Yu Yeh in Semiconductor Technology
Introduction
Fang-Yu Yeh is a prominent inventor based in Hsinchu, Taiwan, known for his contributions to semiconductor technology. With a total of 4 patents to his name, he has made significant advancements in the manufacturing processes of semiconductor devices.
Latest Patents
Fang-Yu Yeh's latest patents include innovative methods that enhance the efficiency and effectiveness of semiconductor device fabrication. One of his notable patents is titled "Two-step GC etch for GC profile and process window improvement." This method involves defining a semiconductor substrate, forming a gate oxide, and utilizing a two-step etching process to improve the profile and process window of the semiconductor device. Another significant patent is the "Method of forming semiconductor device with non-conformal liner layer that is thinner on sidewall surfaces." This method provides a unique approach to forming contact openings, ensuring uniformity in the liner layer on the substrate while eliminating the need for additional etching operations.
Career Highlights
Fang-Yu Yeh is currently employed at Promos Technologies, Inc., where he continues to innovate in the field of semiconductor technology. His work focuses on developing advanced manufacturing techniques that contribute to the efficiency and performance of semiconductor devices.
Collaborations
Fang-Yu Yeh has collaborated with notable colleagues in his field, including Chun-Che Chen and Chi Chou Lin. These collaborations have further enhanced his research and development efforts in semiconductor technology.
Conclusion
Fang-Yu Yeh's contributions to semiconductor technology through his patents and innovative methods have positioned him as a key figure in the industry. His work continues to influence the future of semiconductor manufacturing processes.