Hsinchu, Taiwan

Fang-Hao Hsu

This inventor holds 7 USPTO granted patents and 1 published patent application. Top assignee: Macronix International Co., Ltd.. Active years: 2014-2017.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Fang-Hao Hsu. Retrieved from https://idiyas.com/inventor/fang-hao-hsu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0

Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014-2017

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7 patents (USPTO):Explore Patents

Title: The Innovations of Fang-Hao Hsu

Introduction

Fang-Hao Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.

Latest Patents

Among his latest patents is a method for fabricating a semiconductor device. This method involves forming a first material layer, a second material layer, and a mask layer on a substrate. A portion of the second material layer is removed through a first etching process, exposing the first material layer and creating a first pattern layer and a second pattern layer. Additionally, a second etching process removes part of the first material layer, exposing a portion of the substrate. The third etching process removes a portion of the substrate, resulting in the formation of first and second trenches with varying angles on their sidewalls.

Another notable patent describes a method for controlling the contact hole profile for metal fill-in. This method eliminates overhang in a contact hole formed in a contact film stack. A liner layer is overlaid on the contact film stack, coating the contact hole. By removing a portion of the liner to expose the overhang, the exposed overhang can be eliminated. The liner also fills in a bowing profile of the contact hole, ensuring that the sidewalls are smooth and straight, which is essential for effective metal fill-in while minimizing piping defects.

Career Highlights

Fang-Hao Hsu is currently employed at Macronix International Co., Ltd., where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable coworkers, including Hong-Ji Lee and Zusing Yang, further enhancing the innovative environment at Macronix International Co., Ltd.

Conclusion

Fang-Hao Hsu's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents reflect a commitment to improving manufacturing processes and device performance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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