Company Filing History:
Years Active: 2014-2017
Title: The Innovations of Fang-Hao Hsu
Introduction
Fang-Hao Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on innovative methods for fabricating semiconductor devices, which are crucial for modern electronics.
Latest Patents
Among his latest patents is a method for fabricating a semiconductor device. This method involves forming a first material layer, a second material layer, and a mask layer on a substrate. A portion of the second material layer is removed through a first etching process, exposing the first material layer and creating a first pattern layer and a second pattern layer. Additionally, a second etching process removes part of the first material layer, exposing a portion of the substrate. The third etching process removes a portion of the substrate, resulting in the formation of first and second trenches with varying angles on their sidewalls.
Another notable patent describes a method for controlling the contact hole profile for metal fill-in. This method eliminates overhang in a contact hole formed in a contact film stack. A liner layer is overlaid on the contact film stack, coating the contact hole. By removing a portion of the liner to expose the overhang, the exposed overhang can be eliminated. The liner also fills in a bowing profile of the contact hole, ensuring that the sidewalls are smooth and straight, which is essential for effective metal fill-in while minimizing piping defects.
Career Highlights
Fang-Hao Hsu is currently employed at Macronix International Co., Ltd., where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.
Collaborations
He has collaborated with notable coworkers, including Hong-Ji Lee and Zusing Yang, further enhancing the innovative environment at Macronix International Co., Ltd.
Conclusion
Fang-Hao Hsu's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents reflect a commitment to improving manufacturing processes and device performance.