Company Filing History:
4 out of 37 
1 out of 6 Years Active: 2022-2024
Title: Innovations of Faguo Liang in On-Wafer Calibration Technologies
Introduction
Faguo Liang is a notable inventor based in Shijiazhuang, China. He has made significant contributions to the field of on-wafer calibration technologies, holding a total of five patents. His work focuses on methods and models that enhance the accuracy and efficiency of measurements in electronic components.
Latest Patents
Faguo Liang's latest patents include a method for determining parameters in an on-wafer calibration piece model. This method involves constructing a model set that includes various on-wafer calibration piece models. It also includes selecting a model, measuring the corresponding calibration piece using a specialized S parameter measurement system, and calculating parameters that represent crosstalk. Another significant patent is the two-port on-wafer calibration piece circuit model and method for determining parameters. This method entails measuring a single-port model to obtain an S parameter, calculating intrinsic capacitance, and measuring the two-port model to derive parasitic capacitance and resistance values.
Career Highlights
Faguo Liang has worked at the 13th Research Institute of China Electronics Technology Group Corporation and the 13th Research Institute of China Electronics. His experience in these institutions has allowed him to develop and refine his innovative techniques in the field of electronics.
Collaborations
Faguo Liang has collaborated with notable coworkers, including Aihua Wu and Yibang Wang. Their joint efforts have contributed to advancements in calibration technologies.
Conclusion
Faguo Liang's contributions to on-wafer calibration technologies demonstrate his expertise and innovative spirit. His patents reflect a commitment to improving measurement techniques in electronics, making a lasting impact in the field.