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For the Inventor, By the Inventor

San Jose, CA, United States of America

Evangelos T Spyropoulos

This inventor holds 11 USPTO granted patents. Top assignee: Lam Research Corporation. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Evangelos T Spyropoulos. Retrieved from https://idiyas.com/inventor/evangelos-t-spyropoulos

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 11

% Patents Active = 81.8

Average Co-Inventor Count = 2.8

ph-index = 3

Forward Citations = 15(Granted Patents)


Company Filing History:

goldMedal11 out of 3,945 
 
Lam Research Corporation
 patents

Years Active: 2015-2026

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11 patents (USPTO):Explore Patents
1. 12666898 - Gas box with cross-flow exhaust system (2026-06-23),
2. 12241772 - Flow metrology calibration for improved processing chamber matching in substrate processing systems (2025-03-04),
3. 11959793 - Flow metrology calibration for improved processing chamber matching in substrate processing systems (2024-04-16),
4. 10760944 - Hybrid flow metrology for improved chamber matching (2020-09-01),
5. 10002747 - Methods and apparatus for supplying process gas in a plasma processing system (2018-06-19),
6. 9778083 - Metrology method for transient gas flow (2017-10-03),
7. 9721763 - Systems and methods for providing gases to a process chamber (2017-08-01),
8. 9364870 - Ultrasonic cleaning method and apparatus therefore (2016-06-14),
9. 9174249 - Ultrasonic cleaning method and apparatus therefore (2015-11-03),
10. 9091397 - Shared gas panels in plasma processing chambers employing multi-zone gas feeds (2015-07-28),
11. 9090972 - Gas supply systems for substrate processing chambers and methods therefor (2015-07-28),

Title: Evangelos T Spyropoulos: Innovator in Flow Metrology Calibration

Introduction

Evangelos T Spyropoulos is a prominent inventor based in San Jose, CA (US). He has made significant contributions to the field of substrate processing systems, holding a total of 11 patents. His work focuses on improving the accuracy and efficiency of gas flow metrology systems.

Latest Patents

One of his latest patents is titled "Flow Metrology Calibration for Improved Processing Chamber Matching in Substrate Processing Systems." This innovative method involves several steps, including measuring temperature and pressure using various sensors, performing flow rate measurements, and scaling these measurements to determine a corresponding transfer function for calibration gases. This patent exemplifies his commitment to enhancing the precision of substrate processing technologies.

Career Highlights

Evangelos T Spyropoulos is currently employed at Lam Research Corporation, a leading company in the semiconductor industry. His expertise in flow metrology has positioned him as a key player in the development of advanced processing systems. His contributions have been instrumental in driving innovation within the company.

Collaborations

Throughout his career, Evangelos has collaborated with notable colleagues, including Iqbal A Shareef and Mark Taskar. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Evangelos T Spyropoulos is a distinguished inventor whose work in flow metrology calibration has significantly impacted substrate processing systems. His innovative patents and collaborations continue to drive advancements in the semiconductor industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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