The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
Dec. 31, 2012
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Iqbal Shareef, Fremont, CA (US);
Mark Taskar, San Mateo, CA (US);
Evangelos Spyropoulos, San Jose, CA (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16K 11/16 (2006.01); C23C 16/455 (2006.01); G05D 11/13 (2006.01); G05D 7/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45561 (2013.01); G05D 7/06 (2013.01); G05D 11/132 (2013.01);
Abstract
A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers.