Eunsung Kim

Title: Eunsung Kim: Innovator in Pattern Fabrication Technologies

Introduction

Eunsung Kim is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of pattern fabrication, holding a total of eight patents. His innovative methods have advanced the technology used in various applications, particularly in the semiconductor industry.

Latest Patents

Among his latest patents is a method of fabricating pattern structures. This method involves forming mask patterns spaced apart on an etch target layer, filling openings with a block copolymer material, and annealing it to create distinct patterns. The first patterns consist of first polymer blocks, while the second patterns are made of second polymer blocks. Another notable patent is focused on methods of forming fine patterns. This process includes forming a mask on an etching target, applying an anti-reflective layer, and phase-separating a block copolymer layer to create fine patterns on the substrate.

Career Highlights

Eunsung Kim has worked with leading organizations such as Samsung Electronics Co., Ltd. and Sungkyunkwan University. His experience in these institutions has allowed him to refine his skills and contribute to groundbreaking research in his field.

Collaborations

He has collaborated with notable colleagues, including Shiyong Yi and Chulho Shin, further enhancing the impact of his work in the industry.

Conclusion

Eunsung Kim's innovative approaches to pattern fabrication have positioned him as a key figure in the field. His patents reflect a commitment to advancing technology and improving manufacturing processes. His contributions will continue to influence the industry for years to come.