The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 30, 2014
Filed:
Jun. 29, 2012
Eunsung Kim, Seoul, KR;
Kyoungseon Kim, Suwon-si, KR;
Jaewoo Nam, Seoul, KR;
Chulho Shin, Yongin-si, KR;
Shiyong Yi, Hwaseong-si, KR;
Eunsung Kim, Seoul, KR;
Kyoungseon Kim, Suwon-si, KR;
Jaewoo Nam, Seoul, KR;
Chulho Shin, Yongin-si, KR;
Shiyong Yi, Hwaseong-si, KR;
Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;
Abstract
A photolithography method includes coating a photoresist on an active region and an edge region of a wafer, exposing the photoresist on the edge region to first ultraviolet rays, exposing the photoresist on the active region to second ultraviolet rays, depositing a first developing solution on the photoresist on the edge region to remove the photoresist on the edge region, and developing the photoresist on the active region using a second developing solution.