Company Filing History:
Years Active: 2014-2017
Title: Chulho Shin: Innovator in Pattern Formation Technologies
Introduction
Chulho Shin is a prominent inventor based in Yongin-si, South Korea. He has made significant contributions to the field of pattern formation technologies, holding a total of 3 patents. His innovative work has implications in various applications, particularly in the semiconductor industry.
Latest Patents
Chulho Shin's latest patents include groundbreaking methods for forming patterns. One of his notable inventions is a method that involves forming a block copolymer layer on a neutral layer with an uneven structure. This method induces phase separation, allowing for vertical cultivation of phases of the block copolymer. The neutral layer's affinity for both hydrophilic and hydrophobic polymers facilitates a self-assembled phenomenon on the uneven structure. Another significant patent is a photolithography method that includes a dual development process. This method enhances the efficiency of pattern formation by utilizing different ultraviolet rays and developing solutions to precisely remove photoresist from specific regions of a wafer.
Career Highlights
Chulho Shin is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of innovation in his field. His work at Samsung has allowed him to collaborate with leading experts and contribute to cutting-edge technologies.
Collaborations
Chulho has worked alongside talented colleagues, including Eunsung Kim and Jaewoo Nam. Their collaborative efforts have further advanced the research and development of innovative technologies in pattern formation.
Conclusion
Chulho Shin's contributions to the field of pattern formation are noteworthy, with his patents reflecting a deep understanding of complex materials and processes. His work at Samsung Electronics Co., Ltd. continues to influence advancements in technology, showcasing the importance of innovation in today's rapidly evolving landscape.