Eundo Bae

Title: Eundo Bae: Innovator in Plasma Processing Technology

Introduction

Eundo Bae is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of plasma processing technology, particularly in substrate cleaning methods. His innovative approach has led to the development of a unique patent that addresses challenges in the semiconductor industry.

Latest Patents

Eundo Bae holds a patent for a cleaning method and plasma processing apparatus. This patent outlines a substrate cleaning method that includes providing a substrate with a low-k layer containing silicon to a substrate support. The process involves etching the low-k layer using plasma generated from a first gas, separating the etched substrate from the support, and removing any reaction products attached to the substrate using plasma from a second gas. The second gas comprises a first carbon-containing gas represented by CHF (y≥0, x/z>¼). This innovative method enhances the efficiency and effectiveness of substrate cleaning in semiconductor manufacturing.

Career Highlights

Eundo Bae is currently employed at Tokyo Electron Limited, a leading company in the semiconductor equipment industry. His work at Tokyo Electron has allowed him to collaborate with other talented professionals and contribute to advancements in technology. His expertise in plasma processing has positioned him as a key figure in the development of innovative solutions for the semiconductor sector.

Collaborations

Eundo Bae has worked alongside notable colleagues such as Wakako Ishida and Yasunori Hatamura. Their collaborative efforts have fostered an environment of innovation and creativity, leading to significant advancements in their respective fields.

Conclusion

Eundo Bae's contributions to plasma processing technology and his innovative cleaning method have made a lasting impact on the semiconductor industry. His work exemplifies the importance of innovation in driving technological advancements.