North Branford, CT, United States of America

Eugene F Rothgery


Average Co-Inventor Count = 1.7

ph-index = 9

Forward Citations = 425(Granted Patents)


Location History:

  • No. Branford, CT (US) (1989)
  • Branford, CT (US) (2000)
  • North Branford, CT (US) (1979 - 2001)
  • N. Branford, CT (US) (2001)

Company Filing History:


Years Active: 1979-2001

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40 patents (USPTO):Explore Patents

Title: **Eugene F. Rothgery: Innovator in Cleaning Compositions and Substrate Treatments**

Introduction

Eugene F. Rothgery has established himself as a prominent inventor in the field of cleaning compositions and substrate treatments, with a remarkable portfolio of 40 patents. Residing in North Branford, CT, he has contributed significantly to innovations that address the challenges of photoresist and plasma etch residue removal.

Latest Patents

Among his latest innovations, Rothgery has developed a method for removing photoresist and plasma etch residues from substrates. This method involves contacting the substrate with a specialized cleaning composition, followed by a treatment with ozonated water. The preferred cleaning composition contains water, a hydroxylammonium compound, at least one basic compound, and optionally, a stabilizer and surfactant. Additionally, he has created non-corrosive, aqueous-based cleaning compositions that effectively remove photoresist, plasma etch, and CMP residues. These compositions are designed with components such as hydroxylamine or hydroxylamine salts, fluorine-containing compounds, and water, providing critical solutions in the semiconductor manufacturing processes.

Career Highlights

Rothgery's career has included key roles at notable organizations such as Olin Corporation and Arch Specialty Chemicals, Inc. His work in these companies has been instrumental in advancing the development of cleaning technologies essential for semiconductor applications.

Collaborations

Throughout his career, Rothgery has collaborated with esteemed colleagues like Steven A. Manke and Kenji Honda. These partnerships have facilitated the exchange of ideas and fostered innovation within the industry.

Conclusion

Eugene F. Rothgery's contributions to the field of substrate cleaning technologies have positioned him as a noteworthy inventor with a significant impact on the semiconductor industry. His continuous pursuit of innovation through his numerous patents showcases his dedication to solving complex problems through effective cleaning solutions and advanced methodologies.

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