The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
Dec. 15, 1999
Applicant:
Inventors:
Vincent G. Leon, Scottsdale, AZ (US);
Kenji Honda, Barrington, RI (US);
Eugene F. Rothgery, North Branford, CT (US);
Assignee:
Arch Specialty Chemicals, Inc., Norwalk, CT (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 1/62 ; C11D 3/30 ; C11D 3/24 ;
U.S. Cl.
CPC ...
C11D 1/62 ; C11D 3/30 ; C11D 3/24 ;
Abstract
Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.