Olin Corporation

Arch Specialty Chemicals, Inc.

Other

US Government As Represented by the Secretary of the Army

Olin Microelectronic Chemicals, Inc.

Eugene F Rothgery

Steven A Manke

Kenji Honda

Hansjuergen A Schroeder

Vincent G Leon

Lawrence E Katz

David F Gavin

Karl O Knollmueller

Francis W Migliaro, Jr

Carl G Seefried

Edward F Smith

Kiran B Chandalia

Walter A Gay

Max M Boudakian

Robert N Scott

Bonnie B Sandel

Steven D Phillips

Nathan Klein

Kimberly A Thomas

Chares S Leveritt

Frank W Migliaro

Hans Juergen Schroeder

Richard Henderson

Steven W Bunte

Ernest J Kirschke

Mary G Harscher

William W Hart

A method for the removing of plasma etch residues on a substrate comprising the steps of: (i) contacting the substrate with a cleaning composition, and (ii) contacting the substrate with ozonated water. The preferred cleaning composition has a pH from 2 to 6 and comprises: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.

Method for removing photoresist and plasma etch residues

Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound; (ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

Cleaning composition and method for removing residues

The stability of HAN, HAN derivatives or hydroxylamine, and compositions comprising these is considerably enhanced by employing a stabilizing effective amount of a stabilizer selected from (a) a pyridine or pyridone salt, or an acid thereof; (b) a diphosphonate or methylenephosphonate salt, or an acid thereof; or (c) a mixture of two or more stabilizers, wherein at least one is selected from (a) and at least one is selected from (b). Stabilized HAN, HAN derivatives, or hydroxylamine or compositions comprising HAN, an HAN derivative or hydroxylamine, along with a process for providing these stabilized compositions is described. A stabilizer mixture having enhanced, synergistic stabilizing properties is described as well.

Stabilizers for hydroxylammonium nitrate, hydroxylammonium nitrate derivatives, hydroxylamine and compositions containing the same

Non-corrosive cleaning compositions that are useful for removing photoresist and/or plasma etch residues from a substrate. The cleaning composition comprises: (i) a hydroxy-(lower alkyl)-hydrazine, (ii) water, and (iii) at least one compound selected from the group consisting of a carboxylic acid, a water-miscible organic solvent and mixtures thereof.

Non-corrosive cleaning composition and method for removing photoresist

Non-corrosive cleaning compositions that are aqueous based and useful for removing photoresist, plasma etch and CMP residues from a substrate. One preferred cleaning composition comprises: (i) a hydroxylamine or a hydroxylamine salt compound;(ii) at least one fluorine-containing compound; and (iii) water. Another cleaning composition comprises: (i) a compound selected from the group consisting of: an amine, a quatenary ammonium hydroxide, and ammonium hydroxide; (ii) at least one fluorine-containing compound; and (iii) water.

A non-corrosive cleaning composition for removing plasma etching residues having a pH from 2 to 6 and comprising: (A) water; (B) at least one selected hydroxylammonium compound; and (C) at least one basic compound; and optionally (D) a chelating stabilizer; and optionally (E) a surfactant.

Non-corrosive cleaning composition for removing plasma etching residues

Disclosed is a stabilized hydroxylammonium nitrate or hydroxylamine-containing composition comprising said hydroxylammonium nitrate or hydroxylamine and a pyridine or pyridone salt, or an acid thereof, said pyridine or pyridone salt, or acid thereof, being present in said composition in an amount of between about 0.0001% and about 2%, based upon the weight of said composition. Also disclosed is a process for preparing this composition.

Pyridine and pyridone stabilizers for hydroxylammonium nitrate and

The present invention relates to a liquid or gel propellant comprising an oxidizer and a fuel, said fuel preferably having a vapor pressure not exceeding 10 millimeters of mercury at 25.degree. C. and being selected from the group consisting of hydroxy-(lower alkyl)-hydrazine, dihydroxy-(lower alkyl)hydrazine, cyanoethylhydrazine, 1-methyl-1-cyanoethylhydrazine, 1,1-dimethyl-2-cyanoethylhydrazine, and combinations thereof. Also claimed is a method of making the propellant.

Use of reduced volatility substituted hydrazine compounds in

The compound 5-aminotetrazole is prepared by a process which comprises (a) reacting a hydrazine salt of a mineral acid with cyanamide to form the corresponding aminoguanidine salt, (b) diazotizing the aminoguanidine salt to the corresponding guanylazide salt, and (c) cyclizing the guanylazide salt to 5-aminotetrazole.

Process for the preparation of 5-aminotetrazole

The present invention relates to a novel compound which is the hydroxylammonium or lower alkyl hydroxylammonium salt of 3-nitro-1,2,4-triazol-5-one, together with processes for preparation thereof. One process comprises a two-step reaction comprising: (a) reacting 3-nitro-1,2,4-triazol-5-one with an aqueous alkali metal or alkaline earth metal hydroxide to form an aqueous solution of an alkali metal or alkaline earth metal salt of 3-nitro-1,2,4-triazol-5-one, and (b) reacting said alkali metal or alkaline earth metal salt of 3-nitro-1,2,4-triazol-5-one with an aqueous solution of hydroxylammonium salt or lower alkyl-substituted hydroxylammonium salt to form the hydroxylammonium salt of 3-nitro-1,2,4-triazol-5-one. Another process comprises (a) reacting an aqueous solution of a hydroxylammonium salt or lower alkyl-substituted hydroxylammonium salt with an alkali metal or alkaline earth metal hydroxide to form an aqueous solution of a hydroxylamine free base and (b) reacting said free base with an aqueous solution or slurry of 3-nitro-1,2,4-triazol-5-one at a temperature of between about 5.degree. C. and about 50.degree. C. and at atmospheric pressure.

Preparation of hydroxylammonium salts of 5-nitro-1,2,4-triazol-3-one

Hydroxylammonium salts of 5-nitro-1,2,4-triazol-3-one

The present invention relates to a continuous process for making an alkali metal azide or an alkaline earth metal azide which comprises the steps of: (a) reacting a first reaction mixture comprising an alkali metal nitrite or alkaline earth metal nitrite, a C1--C3 alkanol, and a high boiling acid in a first reactor to form a gaseous C1-C3 alkyl nitrite, (b) controllably feeding said gaseous C1-C3 alkyl nitrite into a second reactor and reacting in a controlled manner a second reaction mixture comprising said gaseous C1-C3 alkyl nitrite, hydrazine, and an alkali metal hydroxide or alkaline earth metal hydroxide, in the presence of an organic solvent, thereby producing an alkali metal azide or alkaline earth metal azide, and (c) removing said alkali metal azide or alkaline earth metal azide from said second reactor and replenishing said reaction mixture in said second reactor to provide a continuous, controlled process for producing said alkali metal azide or alkaline earth metal azide.

Continuous process for the production of azide salts

A process for producing chloride ion-free 1,2,4-triazol-5-one which comprises: a) heating a mixture of hydrazodicarbonamide and formic acid to a reflux temperature for said mixture, b) refluxing said mixture at said reflux temperature for a time sufficient to cause said mixture to change its visual appearance from a cloudy mixture to a clear solution, and c) removing unreacted formic acid from said clear solution to provide the desired 1,2,4-triazol-5-one product free of chloride ion.

Process for the production of 1,2,4-triazol-5-one

The present invention relates to a process for ridding moss from an unwanted location such as lawns, walls, monuments, building foundations, tombstones, and combinations thereof which comprises contacting moss growing in said unwanted location with a mossicidal effective amount of a pyrithione salt.

Use of pyrithione for the control of moss

In a process for the production of Alkyl substituted 5-amidotetrazole compounds represented by the formula: ##STR1## wherein A represents NHX or NRR'

Growing community of inventors

North Branford, CT, United States of America

Eugene F Rothgery