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Years Active: 2007-2009
Title: Etsuro Kishio: Innovator in Semiconductor Technology
Introduction
Etsuro Kishio, based in Kyoto, Japan, is a notable inventor recognized for his contributions to semiconductor technology. With a total of two patents to his name, Kishio has made significant strides in enhancing the manufacturing processes of semiconductor devices.
Latest Patents
Kishio's innovative work is reflected in his latest patents. One patent, titled "Method of Manufacturing Semiconductor Device," describes a process where a semiconductor substrate is introduced into a heat treatment apparatus at low temperatures ranging from room temperature to approximately 50°C. This method allows the organic substances contained in the metal on the semiconductor substrate to be released without carbonization during the annealing process, prior to chemical mechanical polishing (CMP). Additionally, it decomposes organic substances that prevent corrosion of the metal, enabling the diffusion of organic substances, chlorine, sulfuric acid, and ammonia from the metal film by controlling the heating rate to 15°C/min or less until the designated heat treatment temperature is achieved.
His second patent, "Cleaning Composition for Removing Resists and Method of Manufacturing Semiconductor Device," outlines a cleaning composition that enhances the efficiency of removing resist residues and other etching residues after processes such as etching or ashing. This composition includes a salt of hydrofluoric acid and a non-metal base, a water-soluble organic solvent, an organic or inorganic acid, water, and optionally, an ammonium salt, contributing to improved corrosion resistance for copper and insulating films.
Career Highlights
Etsuro Kishio has had a fruitful career with significant tenures at leading technology firms. He has worked at Renesas Technology Corporation and Matsushita Electric Industrial Co., Ltd., where he honed his expertise in semiconductor manufacturing processes and significantly contributed to various projects.
Collaborations
Throughout his career, Kishio has collaborated with notable individuals such as Yoshiharu Hidaka and Itaru Kanno. These partnerships have fostered an environment of innovation and skill-sharing, enhancing the development of advanced semiconductor technologies.
Conclusion
Etsuro Kishio’s work exemplifies the critical role of inventors in the advancing field of semiconductor technology. His patents not only address current manufacturing challenges but also pave the way for further innovations. His contributions are invaluable assets to the technology sector, promoting efficiency and effectiveness in semiconductor device production.