Ernst Habekotte

Title: Ernst Habekotte: Innovator in Lithography Technology

Introduction

Ernst Habekotte is a notable inventor based in Delft, Netherlands. He has made significant contributions to the field of lithography, particularly in the development of advanced systems for patterning targets using charged particle beamlets. With a total of 2 patents, his work is at the forefront of innovation in this specialized area.

Latest Patents

One of Habekotte's latest patents is focused on a data path for lithography apparatus. This invention relates to a maskless lithography system that utilizes a plurality of charged particle beamlets for patterning. The system features an electron optical column equipped with a blanker array that modulates the beamlets. This array includes receivers for data signals and blanker elements that adjust the beamlets according to these signals. Additionally, the data path comprises a preprocessing system for processing pattern data and multiple transmission channels for sending this processed data to the blanker elements. The system also includes a pattern streaming system that generates data signals, with first and second channel selectors facilitating the transmission of pattern data.

Another significant patent by Habekotte involves a modulator designed for a multi-beamlet lithography system. This modulator is capable of influencing the direction of a beamlet and includes a light-sensitive element that converts light from a modulated beam into a signal. The modulator also features discretizing means that convert this signal into a discrete signal with predefined values, which is then provided to the influencing means.

Career Highlights

Ernst Habekotte is currently employed at Mapper Lithography IP B.V., where he continues to push the boundaries of lithography technology. His expertise and innovative mindset have positioned him as a key player in the industry.

Collaborations

Throughout his career, Habekotte has collaborated with talented individuals such as Marco Jan-Jaco Wieland and Floris Pepijn Van Der Wilt. These collaborations have further enriched his work and contributed to advancements in lithography.

Conclusion

Ernst Habekotte's contributions to lithography technology through his patents and collaborations highlight his role as an influential inventor in the field. His innovative approaches continue to shape the future of lithography systems.