The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Nov. 07, 2011
Marco Jan-jaco Wieland, Delft, NL;
Teunis Van DE Peut, Leusden, NL;
Floris Pepijn Van Der Wilt, Voorburg, NL;
Ernst Habekotte, Delft, NL;
Marco Jan-Jaco Wieland, Delft, NL;
Teunis Van De Peut, Leusden, NL;
Floris Pepijn Van Der Wilt, Voorburg, NL;
Ernst Habekotte, Delft, NL;
MAPPER LITHOGRAPHY IP B.V., Delft, NL;
Abstract
The invention relates to a maskless lithography system for patterning a target using a plurality of charged particle beamlets. The system comprises an electron optical column including a blanker array for modulating the beamlets. The blanker array includes receivers for receiving data signals and blanker elements for modulating the beamlets in accordance with the data signals. The system further comprises a data path comprising a preprocessing system for processing pattern data and a plurality of transmission channels for transmitting processed pattern data to the blanker elements. The data path further comprises a pattern streaming system for receiving pattern data and generating data signals. First and second channel selectors connect a subset of selected transmission channels for pattern data transmission. The first channel selector is connected between the preprocessing system and the transmission channels. The second channel selector is connected between the channels and the blanker elements.