Floris Pepijn Van Der Wilt

Title: Floris Pepijn Van Der Wilt: Innovator in Lithography Technology

Introduction

Floris Pepijn Van Der Wilt is a notable inventor based in Voorburg, Netherlands. He has made significant contributions to the field of lithography, particularly in the development of advanced systems for patterning targets using charged particle beamlets. With a total of 2 patents to his name, Van Der Wilt continues to push the boundaries of innovation in this specialized area.

Latest Patents

One of his latest patents is titled "Data path for lithography apparatus." This invention relates to a maskless lithography system designed for patterning a target using multiple charged particle beamlets. The system features an electron optical column that includes a blanker array for modulating the beamlets. The blanker array is equipped with receivers for data signals and blanker elements that modulate the beamlets according to these signals. Additionally, the system comprises a data path that includes a preprocessing system for processing pattern data and several transmission channels for sending the processed data to the blanker elements. A pattern streaming system is also part of the invention, which generates data signals from the received pattern data.

Another significant patent by Van Der Wilt is focused on a "Modulator circuitry." This invention pertains to a modulator that adjusts the magnitude of a beamlet in a multi-beamlet lithography system. The modulator includes mechanisms for influencing the direction of a beamlet, a light-sensitive element that converts light from a modulated beam into a signal, and discretizing means that transform this signal into discrete values. This innovation enhances the precision and effectiveness of lithography processes.

Career Highlights

Floris Pepijn Van Der Wilt is currently associated with Mapper Lithography IP B.V., where he applies his expertise in lithography technology. His work has been instrumental in advancing the capabilities of lithography systems, making them more efficient and effective for various applications.

Collaborations

Throughout his career, Van Der Wilt has collaborated with notable colleagues, including Marco Jan-Jaco Wieland and Ernst Habekotte. These collaborations have contributed to the development of innovative solutions in the field of lithography.

Conclusion

Floris Pepijn Van Der Wilt is a distinguished inventor whose work in lithography technology has led to significant advancements in the field. His patents reflect a commitment to innovation and excellence, positioning him as