Hilversum, Netherlands

Ernst H Granneman


Average Co-Inventor Count = 4.6

ph-index = 5

Forward Citations = 1,393(Granted Patents)


Company Filing History:


Years Active: 1994-2005

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5 patents (USPTO):Explore Patents

Title: The Innovative Mind of Ernst H Granneman

Introduction:

Ernst H Granneman, a talented inventor hailing from Hilversum, NL, has made a significant impact in the field of semiconductor processing and atomic layer deposition. With an impressive portfolio of 5 patents, his groundbreaking contributions have revolutionized the way thin films are grown on substrates.

Latest Patents:

1. Temperature Control for Single Substrate Semiconductor Processing Reactor: Ernst's innovative reactor design features streams of gas that lift the substrate, allowing for non-uniform heating laterally across the substrate. The controller ensures precise temperature control in different heating zones, enhancing the efficiency of semiconductor processing.

2. Atomic Layer Deposition Reactor: This reactor design facilitates the growth of thin films on substrates by subjecting them to alternately repeated surface reactions of vapor-phase reactants. The unique configuration of the reaction chamber and showerhead plate optimizes the reaction process, resulting in high-quality thin films.

Career Highlights:

Ernst H Granneman has lent his expertise to esteemed companies such as ASM International N.V. and Nobel Biocare Services, AG. His tenure at these organizations has been marked by groundbreaking research and innovation in the field of semiconductor processing and atomic layer deposition.

Collaborations:

Throughout his career, Ernst has collaborated with industry peers such as Kai-Erik Elers and Ivo Johannes Raaijmakers. Together, they have pushed the boundaries of technological advancement and brought forth cutting-edge solutions in thin film deposition and semiconductor processing.

Conclusion:

Ernst H Granneman's inventive spirit and dedication to technological advancement have cemented his reputation as a pioneering inventor in the semiconductor industry. His patents and collaborations stand as a testament to his innovative prowess and unwavering commitment to pushing the boundaries of scientific discovery.

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