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Erik Robert Hosler

This inventor holds 10 USPTO granted patents and 3 published patent applications. Top assignees: Globalfoundries Inc., Globalfoundries U.S. Inc.. Active years: 2016-2021.

USPTO Granted Patents = 10 (Patent Applications = 3)

% Patents Active = 90.0

Average Co-Inventor Count = 1.7

ph-index = 2

Forward Citations = 14(Granted Patents)

Location History:

Malta, NY (US) (2017)
Cohoes, NY (US) (2016 - 2021)

Company Filing History:

Globalfoundries U.S. Inc.

patents

Years Active: 2016-2021

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10 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10996564 - Uniformity control of metal-based photoresists (2021-05-04),

2. 10748671 - Radial lithographic source homogenizer (2020-08-18),

3. 10444645 - Balancing collector contamination of a light source by selective deposition (2019-10-15),

4. 9844124 - Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer metrology (2017-12-12),

5. 9754829 - Self-aligned conductive polymer pattern placement error compensation layer (2017-09-05),

6. 9748176 - Pattern placement error compensation layer in via opening (2017-08-29),

7. 9704807 - Pattern placement error compensation layer (2017-07-11),

8. 9633942 - Conductively doped polymer pattern placement error compensation layer (2017-04-25),

9. 9541839 - Method and device for splitting a high-power light beam to provide simultaneous sub-beams to photolithography scanners (2017-01-10),

10. 9392679 - Method, apparatus and system for using free-electron laser compatible EUV beam for semiconductor wafer processing (2016-07-12),

Title: The Innovations of Erik Robert Hosler

Introduction

Erik Robert Hosler is a notable inventor based in Cohoes, NY (US), with a remarkable portfolio of 10 patents. His work primarily focuses on advancements in photoresist technology and lithographic processes, which are crucial in the semiconductor manufacturing industry.

Latest Patents

One of Hosler's latest patents is titled "Uniformity control of metal-based photoresists." This invention involves an EUV photoresist composition that incorporates paramagnetic particles designed to block EUV radiation. The magnetic manipulation of these particles within a deposited layer of photoresist significantly enhances focus control and reduces line width roughness during photolithographic processing. Another significant patent is the "Radial lithographic source homogenizer," which outlines a method for identifying contamination regions in a light source collector. This method includes positioning movable light-blocking elements around a circular aperture to compensate for contamination, thereby improving light transmission.

Career Highlights

Throughout his career, Erik has contributed to leading companies in the semiconductor field, including GlobalFoundries Inc. and GlobalFoundries U.S. Inc. His expertise in photoresist technology has made him a valuable asset in these organizations, where he has played a pivotal role in advancing manufacturing processes.

Collaborations

Erik has collaborated with several talented individuals in his field, including Deniz Elizabeth Civay and Sheldon Meyers. These partnerships have fostered innovation and have led to significant advancements in their respective projects.

Conclusion

Erik Robert Hosler's contributions to the field of semiconductor technology through his patents and collaborations highlight his importance as an inventor. His work continues to influence advancements in photolithography and photoresist applications, showcasing the impact of innovation in the industry.

Profile summary based on public USPTO records.

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