The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2016

Filed:

Dec. 05, 2014
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventor:

Erik Robert Hosler, Cohoes, NY (US);

Assignee:

GlobalFoundries Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/23 (2006.01); H05G 2/00 (2006.01); H01S 3/09 (2006.01); H01S 3/00 (2006.01); H01S 3/04 (2006.01);
U.S. Cl.
CPC ...
H05G 2/008 (2013.01); H01S 3/0071 (2013.01); H01S 3/0407 (2013.01); H01S 3/0903 (2013.01); H01S 3/23 (2013.01);
Abstract

At least one method, apparatus and system for providing an extreme ultraviolet beam for processing semiconductor wafers are disclosed. A level of the EUV beam is monitored. A determination is made as to whether the level of the EUV beam is below a predetermined level. In response to determining that the level of the EUV beam is below the predetermined level, a determination is made as to whether the output of at least one of the first or second laser devices has decreased from an initial level. The output of the at least one of the first or second laser devices is increased in response to determining that the output of at least one of the first or second laser devices has decreased from an initial level.


Find Patent Forward Citations

Loading…